What comes after today’s most advanced lithography tools? At #SPIElitho, experts outlined two possible paths forward: pushing numerical aperture even higher or moving to dramatically shorter wavelengths. 💡
Learn more about these presentations from #SPIElitho 2026: spie.org/news/novel-p...

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We are so grateful to have @[email protected] as a long-time sponsor of #SPIELitho! As a leading #semiconductor + display equipment company, #AppliedMaterials delivers material innovation that changes the world. 🌐 Learn more about their story: www.appliedmaterials.com/us/en/about/...
Congratulations to the 2026 #SPIE Nick Cobb Memorial Scholarship recipient, Shilong Zhang, PhD candidate at Korea Advanced Institute of Science and Technology. 🎉 We're excited to see him accept his award at #SPIELitho!💡 Read the press release here: https://bit.ly/4rzhh3f
Celebrate 50 years of #SPIElitho with us in San Jose! 🥳 Join your community and learn the latest advances in optical lithography, EUVL, metrology, and process integration for semiconductor manufacturing.💡 Learn more and register here: https://bit.ly/4a8tVkl
Calling all researchers in optical and EUV lithography: the SPIE Advanced Lithography + Patterning 2026 call for papers is open now, with abstracts due 10 September! Share your research at this leading #semiconductor conference in San Jose: spie.org/conferences... #EUVL #SPIELitho
Join us on 22 August 2025 to hear from Aki Fujimura of D2S as he presents on curvilinear masks. ⚛️💡 Register for the webinar here: spie-org.zoom.us/web... #SPIELitho
At #SPIElitho, Central Glass Co. unveiled PFAS-free photoresist components, and Merck Electronics KGaA introduced fluorine-free coatings and resists, moving toward a sustainable future. Learn more about how experts want to get PFAS out of lithography materials: spie.org/news/gettin...
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Experts discussed alternative #lithography methods at #SPIElitho. Nanoimprinting offers new design options but needs to improve defect and mask lifespan. Directed self-assembly could boost #EUV yields by ~10%, mainly for memory chips. Read more: spie.org/news/other-...
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At #SPIElitho, experts explored how 3D #lithography is transforming chip manufacturing. As Moore’s Law faces limits, 3D structures like backside power delivery offer a path forward by reducing power bottlenecks and boosting performance. Read more here: spie.org/news/chips-...
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