Andreas Erdmann: The 2026 SPIE Frits Zernike Award for Microlithography
For contributions to the understanding and modeling of image formation and resist patterning in deep and #EUVL, especially photomask's 3D effects, and for #lithography education.
spie.org/news/andreas...
Calling all researchers in optical and EUV lithography: the SPIE Advanced Lithography + Patterning 2026 call for papers is open now, with abstracts due 10 September!
Share your research at this leading #semiconductor conference in San Jose: spie.org/conferences...#EUVL#SPIELitho
At #SPIElitho, Shien-Yang Wu of TSMC outlined the urgent need for energy-efficient computing as AI drives exponential power demands. Innovations in 3D-stacked transistors and #EUVL optimization are helping, but further breakthroughs are needed.
Read more here: spie.org/news/meetin...