Calling all researchers in optical and EUV lithography: the SPIE Advanced Lithography + Patterning 2026 call for papers is open now, with abstracts due 10 September! Share your research at this leading #semiconductor conference in San Jose: spie.org/conferences... #EUVL #SPIELitho

At #SPIElitho, Shien-Yang Wu of TSMC outlined the urgent need for energy-efficient computing as AI drives exponential power demands. Innovations in 3D-stacked transistors and #EUVL optimization are helping, but further breakthroughs are needed. Read more here: spie.org/news/meetin...