Interesting rectangular test patterns (and some stitch artifacts).
The haloing around the high contrast edges is a focus stacking artifact. I think I'm going to switch from stacking to contrast-guided optimization where I pick the single highest contrast tile at each X/Y location rather than merging them to avoid this issue (especially for situations where I'm using a huge stack range to track large planarity errors).
This looks like layer version markings but the names are a little confusing (especially where multiple exist).
I think from this that blue is likely a-Si transistor material. Green is obviously ITO, white is M1, purple M2.
Less clear about light blue, is that possibly an ITO-aSi stack? And what's SINX and GIN and PASS?